{"id":143,"date":"2019-11-29T16:46:15","date_gmt":"2019-11-29T07:46:15","guid":{"rendered":"https:\/\/www.iee.jp\/tokai\/?page_id=143"},"modified":"2020-01-30T12:15:58","modified_gmt":"2020-01-30T03:15:58","slug":"paper2016","status":"publish","type":"page","link":"https:\/\/www.iee.jp\/tokai\/award\/paper2016\/","title":{"rendered":"\u512a\u79c0\u8ad6\u6587\u767a\u8868\u8cde\u53d7\u8cde\u8005 2016\u5e74"},"content":{"rendered":"\n
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Bae\u3000Hansin<\/td>\n\u540d\u53e4\u5c4b\u5927\u5b66<\/td>\nEvaluation of O Ion Flux in VHF-DC Magnetron Sputtering<\/td>\n<\/tr>\n
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